منابع مشابه
Deposition of permalloy films by filtered cathodic vacuum arc
The filtered cathodic vacuum arc technique was employed to deposit magnetic films such as FeNi on silicon substrate. Using the normal cathode design, tetrahedral amorphous carbon and metals films can be deposited. If a magnetic target is used, the arc spot always preferably moves to the edge of the target and then extinguishes. Therefore, the arc is not stable and no film can be deposited. A ca...
متن کاملPlasma-based ion implantation utilising a cathodic arc plasma
Plasma-based ion implantation (PBII) is usually carried out with isotropic gaseous plasmas, such as a discharge in nitrogen. More recently, it has been applied using drifting plasmas, such as those produced by cathodic arcs, in order to allow efficient implantation of metallic species. The condensable nature of a cathodic arc plasma allows for the deposition of ion-stitched thin film coatings, ...
متن کاملPlasma instability of a vacuum arc centrifuge.
Ever since conception of the vacuum arc centrifuge in 1980, periodic fluctuations in the ion saturation current and floating potential have been observed in Langmuir probe measurements in the rotation region of a vacuum arc centrifuge. In this work we develop a linearized theoretical model to describe a range of instabilities in the vacuum arc centrifuge plasma column, and then test the validit...
متن کاملAn interchangeable-cathode vacuum arc plasma source.
A simplified vacuum arc design [based on metal vapor vacuum arc (MeVVA) concepts] is employed as a plasma source for a study of a (7)Be non-neutral plasma. The design includes a mechanism for interchanging the cathode source. Testing of the plasma source showed that it is capable of producing on the order of 10(12) charges at confinable energies using a boron-carbide disk as the cathode target....
متن کاملProperties of nitrogen doped tetrahedral amorphous carbon films prepared by filtered cathodic vacuum arc technique
The properties of nitrogen doped tetrahedral amorphous carbon films prepared by the filtered cathodic vacuum arc technique have been studied. The doping species, nitrogen ions, were produced by an ion beam source. The nitrogen flow rate was varied from 0.5 to 10 sccm while keeping other deposition conditions constant. The nitrogen content in deposited films was determined by Rutherford backscat...
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ژورنال
عنوان ژورنال: IEEE Transactions on Plasma Science
سال: 2007
ISSN: 0093-3813
DOI: 10.1109/tps.2007.893265